The ingot is then ground into a perfect 200mm- (8″) or 300mm-diameter (12″) cylinder, with a small, flat cut on one side for positioning accuracy and handling. Each ingot is then cut with a high-precision diamond saw into more than a thousand circular wafers, each less than a millimeter thick. Each wafer is then polished to a mirror-smooth surface.

Microprocessor Manufacturing

Chips are manufactured from the wafers using a process called photolithography. Through this photographic process, transistors and circuit and signal pathways are created in semiconductors by depositing different layers of various materials on the chip, one after the other. Where two specific circuits intersect, a transistor or switch can be formed.

The photolithographic process starts when an insulating layer of silicon dioxide is grown on the wafer through a vapor deposition process. Then a coating of photoresist material is applied, and an image of that layer of the chip is projected through a mask onto the now light-sensitive surface.

Doping is the term used to describe chemical impurities added to silicon, creating a material with semiconductor properties. The projector uses a specially created mask, which is essentially a negative of that layer of the chip etched in chrome on a quartz plate. Modern processors have 20 or more layers of material deposited and partially etched away (each requiring a mask) and up to six or more layers of metal interconnects.

As the light passes through a mask, the light is focused on the wafer surface, exposing the photoresist with the image of that layer of the chip. Each individual chip image is called a die. A device called a stepper then moves the wafer over a little bit, and the same mask is used to imprint another chip die immediately next to the previous one. After the entire wafer is imprinted with a layer of material and photoresist, a caustic solution washes away the areas where the light struck the photoresist, leaving the mask imprints of the individual chip circuit elements and pathways. Then, another layer of semiconductor material is deposited on the wafer with more photoresist on top, and the next mask is used to expose and then etch the next layer of circuitry. Using this method, the layers and components of each chip are built one on top of the other until the chips are completed.

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